Extreme-ultraviolet spectral purity and magnetic ion debris mitigation by use of low-density tin targets.
نویسندگان
چکیده
We investigate the extreme-ultraviolet (EUV) emission from targets that contain tin as an impurity and the advantages of using these targets for ion debris mitigation by use of a magnetic field. The EUV spectral features were characterized by a transmission grating spectrograph. The in-band EUV emission energy was measured with a calorimeter of absolute calibration. The ion flux coming from the plume was measured with a Faraday cup. Our studies indicate that 0.5% Sn density is necessary to obtain a conversion efficiency very close to that of full-density Sn. The use of Sn-doped low-Z targets provides a narrower unresolved transition array and facilitates better control of energetic ions in the presence of a moderate magnetic field of 0.64 T.
منابع مشابه
The Repeller Field debris mitigation approach for EUV sources
We describe studies of the debris produced from a high–repetition-rate laser plasma EUVL source based on the mass-limited target concept. In particular, we are developing mass-limited target designs based on complex targets containing tin. Comprehensive analysis of witness-plate detection techniques can reveal many interesting details of the interaction regime, and the impact of the debris. The...
متن کاملComparative study on EUV and debris emission from CO2 and Nd: YAG laser-produced tin plasmas
The emission characteristics of debris from laser-produced tin plasma were investigated for an extreme ultraviolet lithography (EUV) light source. The ions and droplets emitted from tin plasma produced by a CO2 laser or an Nd: YAG laser were detected with Faraday cups and quartz crystal micro-balance (QCM) detectors, respectively. A higher ion kinetic energy and a lower droplet emission were ob...
متن کاملCombined effects of prepulsing and target geometry on efficient extreme ultraviolet production from laser produced plasma experiments and modeling
Laser produced plasmas (LPPs) are currently a promising source of an efficient extreme ultraviolet (EUV) photon source production for advanced lithography. Optimum laser pulse parameters with adjusted wavelength, energy, and duration for a simple planar or spherical tin target can provide 2% to 3% conversion efficiency (CE) in laboratory experiments. Additional effects such as targets with comp...
متن کاملEffects of Plasma Spatial Profile on Conversion Efficiency of Laser Produced Plasma Sources for EUV Lithography
Extreme ultraviolet (EUV) lithography devices that use laser produced plasma (LPP), discharge produced plasma (DPP), and hybrid devices need to be optimized to achieve sufficient brightness with minimum debris generation to support the throughput requirements of High-Volume Manufacturing (HVM) lithography exposure tools with long lifetime. Source performance, debris mitigation, and reflector sy...
متن کاملIon emission measurements and mirror erosion studies for extreme ultraviolet lithography
Mirror erosion by high energy ion emission from extreme UV light sources is one of the main factors contributing to EUVL collector mirror reflectivity degradation. We are measuring ion energy distributions at the mirror distance from the plasma utilizing three different ion diagnostics for the case of tin-doped microscopic droplet laser plasmas. Typical ion energy distributions measured by an e...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
عنوان ژورنال:
- Optics letters
دوره 31 10 شماره
صفحات -
تاریخ انتشار 2006